LBNL MICROSYSTEMS LABORATORY
The LBNL Microsystems Laboratory (MSL) is a Class 10 cleanroom specializing in
the fabrication of radiation detectors on high resistivity silicon wafers.
Using standard industrial fabrication equipment and processes, the MSL provides
tight process control as well as cleanliness levels required to achieve high
yields while working with ultra-pure material. The facility provides the
following capabilities:
Complete lithography line including photoresist coating, exposure
(step-and-repeat
and 1:1 projection), and develop
High temperature processing
including wet and dry oxidation, diffusion, and
chemical vapor deposition of silicon dioxide, silicon nitride, and polysilicon
Thin film deposition of aluminum, indium-tin oxide, and titanium-tungsten
alloy
Wet etching of thin films in dedicated, temperature-controlled,
filtered etch baths
Dry etching of silicon dioxide.
Device fabrication projects in the MSL began with the development of
radiation
detectors for
high energy physics applications. This standard detector process
has been built upon in the subsequent design and fabrication of scientific CCDs
for astronomy, x-ray detection in synchrotron applications, and photo-diodes for
medical imaging.
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